Labs, Facilities & Equipment

Optical Spectroscopic Facility:

Optical Spectroscopic Equipment image

UV-Vis Absorption, micro-Raman
(visible, NIR excitation), FTIR, PhotoLuminescence (PL), PhotoLuminescence Excitation 
(PLE), Ellipsometry.

Ultrafast Ti-Saphhire

Ultrafast Ti-Sapphire, excimer, nitrogen, Ar ion, and solid state  laser systems.

Controlled environment Optical chamber image

Controlled environment optical irradiation chamber with in-situ spectroscopic analysis, closed-loop helium cryogenic cooler.

Near Field Scanning image

Near Field Scanning Optical Microscopy (NSOM),
Atomic Force Microscopy (AFM), 2-D Surface Profilometry.
 
Carbon Nanoscience Facility:
 
Ultra High Vacuum

Ultra-High-Vacuum CVD/Molecular-Deposition tool

 
 
Glass Processing and Characterization Facility:
  • Glass synthesis and preparation (controlled environment furnaces)

Modulated Differential Scanning Calorimeter

Modulated Differential Scanning Calorimeter from TA Instrument model Q-1000. This calorimeter permits to apply a sinusoidal temperature oscillation on a material sample in order to extract its complex heat capacity. This is of particular interest for studying structural dynamics of glasses or for measuring non-reversible thermal processes.
 Differential Scanning Calorimetry Differential Scanning Calorimeter from Mettler Toledo model DSC1. The calorimeter sensors are composed of 56 thermocouples that enable very high resolution measurements. It can also reach heating rates of 200C/min and has a temperature range from -70C to 500C that is ideal to study structural process in low temperature glasses.

Infrared Fluorescence Spectrometer

Infrared Fluorescence Spectrometer from Horiba Jobin Yvon model 1000M. This spectrometer composed of three gratings and three detectors that can measure fluorescence signals from 1 to 10 microns. A light source tunable from 400 to 2000nm is used to provide selected excitation. This spectrometer is ideal for studying infrared emission in rare-earth doped materials.
 FTIR FTIR spectrometer from Bruker model Tensor 27. This FTIR spectrometer permits to collect infrared spectra in transmission, reflection or attenuated total reflection. A fiber coupling attachment with an external MCT detector permits to measure transmission losses in infrared fibers.
 
 
Polymer Synthesis and Processing Laboratory:
  • Facilities to synthesize, process and fabricate polymer based systems & devices.
 
Thin Film Deposition Facility:

Dual Source RF-magnetron Sputter Deposition System

Dual-source RF-magnetron sputtering deposition system

External Quantum Efficiency Measurement System

External Quantum Efficiency (EQE) measurement system
Atomic Force Microscope Atomic Force Microscope System
  • Universal four-point probe station
  • Thermal Evaporation deposition system
  • Optoelectronic thin films characterization lab (Hall Effect measurement)
  • Current-voltage and photovoltaic efficiency measurement
 
Materials Processing and Characterization:
  • Chemical Synthesis Facilities
Porosimeter Porosimeter

Scanning Electron Microscope

Scanning Electron Microscope

Ellipsometer Image

Gaertner L116E Variable Angle Ellipsometer

The ellipsometer is used for measurement of refractive index and film thickness for single layers or complex multilayer stacks ranging from a few angstroms to several microns. The technique is based on the principle of analyzing the change in polarization of reflected light. The L116E model uses a He-Ne laser (λ = 632.8 nm) with a capability to use single angle or two angle measurements (500 and 700).

  • Micro-Raman (visible and near-IR excitation),  
  • Spectral and time-resolved (50 ns resolution)
  • Photoluminescence,  
  • N2 pulsed laser and dye laser system,
  • Controlled environment tube and box furnaces,
  • Computer controlled spin and dip-coaters
 
Surface Chemistry and Electrochemistry Laboratory:
 
MegPie Single wafer MegPie tool (ProSys)
Cyclic Voltammetry Cyclic Voltammetry
  • Megbowl process system
 

High Temperature Ceramic Processing Laboratory:

Spark Plasma sintering

High Temperature Furnaces
Spark plasma sintering (SPS) furnace (SPS 10-3, Thermal Technology,
Santa Rosa, CA)
High-temperature tube furnace-controlled ramp rate up to 1100 °C
High-temperature box furnace-controlled ramp rate up to 1700 °C
Glass melting furnaces-standard box furnace operated up to 800°C
Thermal Gravimetric Analyzer Thermal Gravimetric Analyzer
(Jupiter, NETZCH)
High Temperature Oxidation Test facility
Oxyacetylene torch test facility with high-temperature optical pyrometer constructed in observation with ASTM E- 285-80.
Ceramic Powder processing & Characterization equipment
Slow speed ball mill, high-energy attrition mill, rotary evaporator, SPEX mill, mechanical sieve shaker, hydraulic press, cold-isostatic press, tape-caster, and rheometer.
 
Computational Materials Science and Engineering Laboratory:
  • Abinitio quantum chemical simulation (VASP, Path-Integral Molecular Dynamics code),
  • atomistic simulation tools (Molecular dynamics and Monte Carlo simulators: DL_Poly, Lammps),
  • Finite Element,
  • Finite Difference Time Domain simulators,
  • multiscale-multiphysics suite of codes.
 
Mechanical Testing Laboratory:
 
Stress Strain Analyzer Stress Strain Analyzer
  • MTS tensile testing instrument
  • Hardness testers
  • Microhardness testers
  • Impact testers
  • Fatigue testers
 
Other Facilities:
University Information Technology Services (UITS)
Micro/nano Fabrication Center
W.M. Keck Center for Surface and Interface Imaging (KECK)
University Spectroscopy and Imaging Facilities (USIF)

University of Arizona College of Engineering